rus
Issue #5/2022
G. Vinogradov, K. Mednikov
XORS‑200A IS A BASIC ETCHING MODULE FOR 65–32 nm MASS PRODUCTION
XORS‑200A IS A BASIC ETCHING MODULE FOR 65–32 nm MASS PRODUCTION
DOI: 10.22184/1992-4178.2022.216.5.42.48
XORS‑200A narrow-gap planar module for dielectric etching developed by NPP ESTO JSC is a universal basic 200 mm etching reactor for mass silicon production featuring key 300 mm system level parameters and allowing both high-aspect dielectric etching and multipatterning processes.
XORS‑200A narrow-gap planar module for dielectric etching developed by NPP ESTO JSC is a universal basic 200 mm etching reactor for mass silicon production featuring key 300 mm system level parameters and allowing both high-aspect dielectric etching and multipatterning processes.
Теги: local control modern 300 mm system technologies plasma deposition plasma etching локальное управление процессом плазменное осаждение плазменное травление технологии современной 300‑мм системы
XORS‑200A IS A BASIC ETCHING MODULE FOR 65–32 nm MASS PRODUCTION
Readers feedback
